Dear wien users,<br><br> Thanks for you help! I have known the difference between ELNES and EELS. But I have another question.<br> We can take into account the relative orientation between sample and beam using Telnes program. For hexagonal BN, when x-ray hit the sample along the c axis, electric field is perpendicular to the c axis, so XAS can reflect the bonding in the basal plane (electric field is parallel to the basal plane). But if x-ray is replaced by the electron beam (qx=qy=0), whether the ELNES also reflect the bonding in the basal plane.<br><br> Thank you in advance!<br><br> Tom<p> 
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