<html><head></head><body><div style="color:#000; background-color:#fff; font-family:HelveticaNeue, Helvetica Neue, Helvetica, Arial, Lucida Grande, sans-serif;font-size:12px"><div id="yui_3_16_0_1_1458205762707_3144">Respected Members,</div><div id="yui_3_16_0_1_1458205762707_3124"><br></div><div id="yui_3_16_0_1_1458205762707_3125" dir="ltr">I am working on the behaviour of hydrogen at the Cu/Ni (111)-graphene interface. In case of Ni (111), the atomic H on the interface diffuse inside the the surface. While in case of Cu (111), the H atom stays at the Cu(111)-graphene interface. It seems that H atom experiences more electrostatic repulsion from the graphene in case of Ni (111). Kindly suggest how can I quantify electrostatic repulsion in both cases ? <br></div><div id="yui_3_16_0_1_1458205762707_3126" dir="ltr"><br></div><div id="yui_3_16_0_1_1458205762707_3127" dir="ltr">Best wishes</div><div id="yui_3_16_0_1_1458205762707_3134" dir="ltr">Masood Yousaf</div><div id="yui_3_16_0_1_1458205762707_3135" dir="ltr">UNIST, Korea<br></div></div></body></html>