[Wien] Orientation dependence

[波 康]

Dear wien users,

        Thanks for you help! I have known the difference between ELNES and EELS. But I have another question.
        We can take into account the relative orientation between sample and beam using Telnes program. For hexagonal BN, when x-ray hit the sample along the c axis, electric field is perpendicular to the c axis, so XAS can reflect the bonding in the basal plane (electric field is parallel to the basal plane). But if x-ray is replaced by the electron beam (qx=qy=0), whether the ELNES also  reflect  the  bonding in the basal plane.

         Thank you in advance!

                                                          Tom
       
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